邓 海

 课题组主页:http://www.polymer.fudan.edu.cn/polymer/research/denghai/

 

邓海 博士,教授

Employment

 

DH.jpg

 

 

1998-2000

 

2001-2014

 

2014-2015

 

2015至今

美国罗门哈斯公司

ROHM&HAAS Company, USA

美国英特尔公司

Intel Corporation, USA

東京応化工業株式会社美国分公司

TOK, USA

复旦大学

Fudan University

高级研究员

Senior researcher

高级主任工程师

Senior engineer

院士

Fellow

教授

Professor

 

 

研究领域 (Current Research Area)

Hai Deng, Ph.D.

Professor

Email: haideng@fudan.edu.cn

Tel021-31243292

 

 

Œ极性单体的高度立体定向聚合

 

 

 

半导体光刻用高分子材料的设计合成及应用

 

Education

 

 

1984-1988

 

1990-1992

 

1992-1995

 

1996-1996

 

1997-1998

中山大学

Zhongshan University, China

京都大学

Kyoto university, Janpan

东京工业大学

Tokyo Institute of Technology, Janpan

美国阿克伦大学

University of Akron, USA

加利福尼亚大学伯克利分校

University of California, Berkeley, USA

 

Ž半导体光刻用分子玻璃和导向自组装材料的设计合成及应用

 

 

代表性论文 (Selected Publications)

 

 

 

l  Xuemiao Li; Jie Li; Hai Deng,      Synthesis and Directed Self-Assembly of Modified PS-b-PMMA for Sub-10 nm Nanolithography. Journal of Photopolymer Science and Technology, 2017, 30 (1) :83-86.                                                                                  

 

l  Jie Li; Xuemiao Li; Hai Deng,      Design and Synthesis of Sub-10 nm DSA Materials. SPIE Advanced Lithography, 2017, 10146.                                                                 

 

l  Xuemiao Li; Jie Li; Hai Deng, Design and Synthesis of Novel Directed Self-Assembly Block Copolymers for Sub-10 nm Lithography application. CSTIC (Semicon China). 2017, 7919776.

l  ZEOLITE-SOL GEL NANO-COMPOSITE LOW K DIELECTRIC, H. Deng, US # 7,674,390 (2010)

l  IMMERSION LIQUIDS FOR IMMERSION LITHOGRAPHY; H. Deng et al, US # 7,391,501 (2008)

l  Sub-50 nm Feature Sizes Using Positive Tone Molecular Glass Resists for EUV Lithography. SW Chang, R Ayothi, D Bratton, D Yang, N Felix, HB Cao, H Deng, CK Ober. J. Mater. Chem., 2006, 16, 1470-1474

l  Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography. A De Silva, JK Lee, X André, NM Felix, HB Cao, H Deng, CK Ober. Chem. Mater., 2008, 20 (4), 1606–1613

l  Acid Distribution in Chemically Amplified Extreme Ultraviolet Resist. T Kozawa, S Tagawa, HB Cao, H Deng, MJ Leeson. Journal of Vacuum Science & Technology B, 2007, 25 (6), 2481-2485 

l  Polymerizable Lyotropic Liquid Crystals Containing Transition-Metal and Lanthanide Ions: Architectural Control and Introduction of New Properties into Nanostructured Polymers, H. Deng, D. L. Gin, R. Smith. J. Am. Chem. Soc. 1998, 120, 3522-3523

l  Isospecific Polymerization of MMA Initiated by Chiral Zirconocenedimethly/Ph3CB(C6F5)4 in the Presence of Lewis Acid, H. Deng, T. Shiono, K. Soga. Macromolecules, 1995, 28 (9), 067–3073 

l  Isotactic Polymerization of t-Butyl Acrylate with Chiral Zirconocene, H. Deng, K. Soga. Macromolecules, 1996, 29 (5), 1847–1848

 

美国专利申请:

A rapid self-assembled small-sized block polymer material with low quenching temperature and the preparation and application thereof, 申请号:15/614,211.

中国专利申请:                                                                                     

1一种高度有序的高分子材料”,申请号:2017107586474                     

2一种低淬火温度快速组装的小尺寸嵌段高分子材料及其制备和应用,申请号:2017104126318 

 

 

 

             

 

主要奖励和荣誉 (Awards and Honors)

l  2014年中组部国家千人计划专家

学术任职 (Professional Services)

l